Posted by Luca Latessa (93.63.253.206) on July 19, 2011 at 05:33:36:
Hi, I would need to get SRP of high dose S/D implants (As and B) after a Ge implant amorphization and cobalt salicide formation on the wafer surface.
My question is if the SRP measurement is possible with that low resistivity salicide film (~200A) on top, or if it is necessary/advisable that I strip it away prior to the measurement.
Thanks.